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PVD/CVD Scientific Instruments
Plasma etching equipment
Ultra-High Vacuum High-Energy Pulsed Magnetron Sputtering Coating System (HITSemi-UHV-HIPIMS)
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High-Vacuum Magnetron Sputtering Coating Equipment (Circular Planar Target, Cabinet-Type Integrated Machine) HITSemi-PVD-460SC
High-Vacuum Magnetron Sputtering Coating Equipment (Rectangular Target) HITSemi-PVD-650SR
High-Vacuum Electron Beam Evaporation Coating System HITSemi-PVD-600EB
High-Vacuum Resistive Thermal Evaporation Coating System HITSemi-PVD-420TE
Small Single-Tube LPCVD Low-Pressure Chemical Vapor Deposition Equipment HITSemi-LPCVD-150
LPCVD Equipment HITSemi-LPCVD-200
Small-scale PECVD Plasma-Enhanced Chemical Vapor Deposition Equipment HITSemi-PECVD-460
Small HFCVD Hot‑Filament Chemical Vapor Deposition System HITSemi-HFCVD-X
Inductor–Capacitor Hybrid 3D Plasma Cleaner HITSemi-Plasma-C
Small Plasma Cleaner (Capacitive) HITSemi-Plasma-C1
Small Plasma Cleaner (Inductive Type) HITSemi-Plasma-C2