Micro nano technology and high-end precision manufacturing
Create greater value for customers
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Semiconductor and general semiconductor fields
Manufacturers of R & D, design and production of semiconductor materials, engineering and equipment
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Industrial/research grade thin film deposition equipment
Semiconductor and general semiconductor fields research, design, and production manufacturer specializing in devices, micro-nano materials and devices, as well as advanced precision manufacturing technology
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Development and production of micro-and nano-crystalline diamond films
Large-size diamond polycrystalline wafers for high-power devices,
Heat sink of high frequency device and high power laser
Advanced semiconductor material supplier based on autonomous equipment
PECVD plasma enhanced chemical vapor deposition equipment is mainly used in
Thin film growth of silicon nitride and silicon oxide in clean vacuum environment
Product
The whole equipment is a cluster structure, which is composed of photoelectric conversion film deposition system, MAMS electronic stripping system, exhaust packaging system, getter material vacuum coating system and overall degassing system. Can realize the overall automatic coordination operation, can also be independent operation of each system, do not interfere with each other, can be set between the system interlock. 316 material manufacturing, reserved a number of flange interface.
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Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine
Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine (Sputter-2000W series). This equipment is used for coating high-density through-holes and blind holes in glass and ceramic substrates, with an aspect ratio >10:1.
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MBE Molecular Beam Epitaxy Equipment
Molecular Beam Epitaxy (MBE) equipment can achieve epitaxial growth processes on certain substrates, enabling molecular self-assembly, superlattices, quantum wells, one-dimensional nanowires, and more. It can be used for process verification and the growth and manufacturing of epitaxial wafers for both second-generation and third-generation semiconductors. The MBE equipment provides an ultra-high vacuum environment during thin film epitaxial growth, creating an ideal setting for this process. It effectively eliminates various interference factors during film growth, resulting in high-precision thin films.
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HFCVD Hot-Wire Chemical Vapor Deposition Equipment
We have developed and manufactured hot-filament CVD diamond equipment, which is divided into two categories: experimental models and production models. These devices are primarily used for the research and development and production of micrometer- and nanometer-sized diamond films. They can be applied to the R&D and manufacturing of diamond products across various performance levels, including mechanical, thermal, optical, and acoustic applications. We can produce large-size polycrystalline diamond wafers, which are suitable for use as heat sinks in high-power devices, high-frequency devices, and high-power lasers.
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About Us
Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd.
By the Harbin Institute of Technology (Shenzhen) and has many years of practical experience in the team of engineers to jointly initiate the creation.
Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. was jointly established by Harbin Institute of Technology (Shenzhen) and a team of experienced engineers with many years of practical experience. The company is based at the intersection of technological and market frontiers, seeking innovation leadership and sustainable development, solving industry pain points and localization challenges, and striving for independent and controllable industrial chains. Pengcheng Micro Nano Technology (Shenyang) Co., Ltd. is a wholly-owned subsidiary of Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. It is a design center and manufacturing base for semiconductor and pan semiconductor processes and equipment. The core business of the company is micro nano technology and high-end precision manufacturing, with specific application areas including research and development design, production and manufacturing of semiconductor and pan semiconductor materials, processes, equipment, process technology services, and equipment upgrading and transformation. We can provide process research and development and sampling for users. The company's talent team has a complete knowledge structure, with a high-level materials research and process research team led by professors and PhDs from Harbin Institute of Technology; There is also a team of senior equipment designers from the industrial sector, who have over 30 years of experience in semiconductor material research, epitaxial technology research, and semiconductor thin film preparation equipment design, production, and manufacturing. The company relies on Harbin Institute of Technology (Shenzhen) and has advanced semiconductor research and development equipment platforms and testing equipment platforms, which can carry out scientific research work at a high starting point. The company is headquartered in Shenzhen and has the ability to conduct research and development, production, debugging of semiconductor and pan semiconductor equipment, as well as pilot testing, production, and sales of devices.
Further understandingCompany establishment time
technology patent
technology accumulation
Customer Service
Laboratory and R & D Center
Relying on the complete experimental platform and test analysis platform of Harbin Institute of Technology (Shenzhen), it provides support for R & D and production.
News
2026-02-03
2026-01-28
2026-01-16
Principles, Classification, and Applications of Physical Vapor Deposition (PVD) Technology
2026-01-13
Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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