Micro nano technology and high-end precision manufacturing

Create greater value for customers

More +
Semiconductor and general semiconductor fields

Manufacturers of R & D, design and production of semiconductor materials, engineering and equipment

More +
Industrial/research grade thin film deposition equipment

Semiconductor and general semiconductor fields research, design, and production manufacturer specializing in devices, micro-nano materials and devices, as well as advanced precision manufacturing technology

More +

Development and production of micro-and nano-crystalline diamond films
Large-size diamond polycrystalline wafers for high-power devices,
Heat sink of high frequency device and high power laser

More +
Advanced semiconductor material supplier based on autonomous equipment

PECVD plasma enhanced chemical vapor deposition equipment is mainly used in
Thin film growth of silicon nitride and silicon oxide in clean vacuum environment

More +
scroll down

Product

Total trip system

The whole equipment is a cluster structure, which is composed of photoelectric conversion film deposition system, MAMS electronic stripping system, exhaust packaging system, getter material vacuum coating system and overall degassing system. Can realize the overall automatic coordination operation, can also be independent operation of each system, do not interfere with each other, can be set between the system interlock. 316 material manufacturing, reserved a number of flange interface.

View Details

Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine

Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine (Sputter-2000W series). This equipment is used for coating high-density through-holes and blind holes in glass and ceramic substrates, with an aspect ratio >10:1.

View Details

MBE Molecular Beam Epitaxy Equipment

Molecular Beam Epitaxy (MBE) equipment can achieve epitaxial growth processes on certain substrates, enabling molecular self-assembly, superlattices, quantum wells, one-dimensional nanowires, and more. It can be used for process verification and the growth and manufacturing of epitaxial wafers for both second-generation and third-generation semiconductors. The MBE equipment provides an ultra-high vacuum environment during thin film epitaxial growth, creating an ideal setting for this process. It effectively eliminates various interference factors during film growth, resulting in high-precision thin films.

View Details

HFCVD hot filament chemical vapor deposition equipment

Research and development design and manufacture of hot filament CVD diamond equipment, divided into experimental equipment and production equipment two categories. The equipment is mainly used for R & D and production of micro-crystalline and nano-crystalline diamond films. Can be used for mechanical level, thermal level, optical level, acoustic level of diamond products development and production. It can be used to manufacture large-size diamond polycrystalline wafers for high-power devices, high-frequency devices and heat sinks for high-power lasers.

View Details
Learn about all products

About Us

Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd.

By the Harbin Institute of Technology (Shenzhen) and has many years of practical experience in the team of engineers to jointly initiate the creation.


Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. was jointly established by Harbin Institute of Technology (Shenzhen) and a team of experienced engineers with many years of practical experience. The company is based at the intersection of technological and market frontiers, seeking innovation leadership and sustainable development, solving industry pain points and localization challenges, and striving for independent and controllable industrial chains. Pengcheng Micro Nano Technology (Shenyang) Co., Ltd. is a wholly-owned subsidiary of Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. It is a design center and manufacturing base for semiconductor and pan semiconductor processes and equipment. The core business of the company is micro nano technology and high-end precision manufacturing, with specific application areas including research and development design, production and manufacturing of semiconductor and pan semiconductor materials, processes, equipment, process technology services, and equipment upgrading and transformation. We can provide process research and development and sampling for users. The company's talent team has a complete knowledge structure, with a high-level materials research and process research team led by professors and PhDs from Harbin Institute of Technology; There is also a team of senior equipment designers from the industrial sector, who have over 30 years of experience in semiconductor material research, epitaxial technology research, and semiconductor thin film preparation equipment design, production, and manufacturing. The company relies on Harbin Institute of Technology (Shenzhen) and has advanced semiconductor research and development equipment platforms and testing equipment platforms, which can carry out scientific research work at a high starting point. The company is headquartered in Shenzhen and has the ability to conduct research and development, production, debugging of semiconductor and pan semiconductor equipment, as well as pilot testing, production, and sales of devices.

Further understanding
2021 Year

Company establishment time

60 +

technology patent

30 Year

technology accumulation

200 +

Customer Service

Laboratory and R & D Center

Relying on the complete experimental platform and test analysis platform of Harbin Institute of Technology (Shenzhen), it provides support for R & D and production.

View more

News

Pengcheng Semiconductor Leads the Future: Explosive Growth of TGV and TSV Technologies on the Horizon

2026-02-03

With the rapid development of the semiconductor industry, especially in the field of chip interconnect technologies, through-glass vias (TGV) technology is increasingly becoming a key driver of growth. In the near future, this technology is expected to usher in unprecedented growth opportunities in both the global and Chinese markets. According to the latest market research data, China has already become the world’s largest market for TGV technology applications.

Application of Magnetron Sputtering Technology in the Preparation of Core Thin Films for Key Components in Medical Imaging

2026-01-28

In the ongoing evolution of modern medical imaging technology, magnetron sputtering has become a core process in the field of thin-film fabrication and is widely used in the manufacturing of critical components for medical imaging.

Pengcheng Semiconductor Achieves a New Breakthrough in Magnetron Sputtering Technology, Boosting the Localization of High-End Vacuum Coating Equipment.

2026-01-16

Shenzhen—Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as "Pengcheng Semiconductor"), which has been deeply engaged in the fields of advanced semiconductor packaging and micro- and nano-manufacturing, recently announced a significant technological breakthrough in its independently developed high-vacuum magnetron sputtering coating equipment. The equipment has successfully achieved high-density via plating with a depth-to-diameter ratio exceeding 10:1 in TGV (Through Glass Via) coating processes, injecting new momentum into the development of domestically produced vacuum coating equipment in the field of three-dimensional integration.

Principles, Classification, and Applications of Physical Vapor Deposition (PVD) Technology

2026-01-13

Physical Vapor Deposition (PVD) is an advanced surface engineering technology that, under vacuum conditions, uses physical methods to convert a target material into gaseous atoms, molecules, or ions, which then deposit onto the substrate surface to form a thin film. Since its development in the early 20th century, PVD technology has become a crucial technique in modern additive manufacturing and functional coating applications, owing to its advantages such as environmental friendliness, controllable costs, minimal consumable usage, dense and uniform film properties, and strong adhesion between the film and substrate. PVD enables the on-demand preparation of functional films with properties including wear resistance, corrosion resistance, conductivity, insulation, piezoelectricity, and magnetism, and is widely used across various industries, including mechanical, electronic, construction, and medical sectors.