Small Plasma Cleaner (Inductive Type) HITSemi-Plasma-C2
The energy of the magnetic field is used to excite and sustain the plasma. A set of coils—typically planar or helical coils—is wound around or placed above the reaction chamber, and a high‑frequency alternating current is applied. The alternating current generates a powerful alternating magnetic field within the coils; according to Faraday’s law of electromagnetic induction, this changing magnetic field induces a strong eddy electric field inside the reaction chamber. The induced eddy electric field accelerates electrons, which ultimately excite the gas and generate plasma.
- Product Description
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The energy of the magnetic field is used to excite and sustain the plasma. A set of coils—typically planar or helical coils—is wound around or placed above the reaction chamber, and a high‑frequency alternating current is applied. The alternating current generates a powerful alternating magnetic field within the coils; according to Faraday’s law of electromagnetic induction, this changing magnetic field induces a strong eddy electric field inside the reaction chamber. The induced eddy electric field accelerates electrons, which ultimately excite the gas and generate plasma.
Its high density of active free radicals makes it exceptionally efficient in chemical cleaning. It can clean three-dimensional and complex‑shaped workpieces. It is ideally suited for handling materials and devices that are sensitive to ion bombardment, such as semiconductor chips, microelectromechanical systems (MEMS), and advanced packaging.
Main Features
Miniaturization facilitates laboratory operations and use while significantly reducing experimental costs.
Handling is gentle and uniform, making it suitable for delicate, sensitive components.
No electrode contamination, high cleanliness.Technical Parameters
Product Model HITSemi-Plasma-C2 Ion Source Power Power adjustable from 0 to 200W Ion Source Frequency 13.56MHz Control Form Semi-automatic / Fully automatic Cleaning Time Adjustable from 1s to 9999s Vacuum degree <80 Pa Vacuum pump Pumping speed: 4 L/s (oil mist filtration) Inner cavity (circular) Dimensions: φ160mm × 210mm
Material: Quartz glassCargo tray Glass tray, placed in parallel. Process gas Route 2 (N 2 , Ar, O 2 , H 2 Optional) Control System PLC + Touch Screen Operating Conditions of the Equipment
Power Supply AC 220V (±10V) 50/60Hz Power 1.5KW Operating temperature 10°C–40°C Work environment humidity ≤50%
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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