Pengcheng Semiconductor showcases TGV/TSV/TMV technology at the Munich Shanghai Optical Expo.

The Munich Shanghai Optical Expo is known as the annual event for the laser, optics, and optoelectronics industry in Asia. Since its first event in Shanghai in 2006, its scale and influence have been increasing day by day, and it has become an important communication platform for the global optoelectronics industry. The Munich Shanghai Optical Expo will be held from March 20-22, 2025, at the Shanghai New International Expo Center (No. 2345 Longyang Road, Pudong New District, Shanghai). At that time, Pengcheng Semiconductor will showcase cutting-edge thin film deposition equipment and technology solutions at booth E4-4631. The PVD/CVD technology based on nano and atomic manufacturing is used for high-quality thin film preparation. For example, using magnetron sputtering technology for single crystal film preparation and applying magnetron sputtering to molecular beam epitaxy's beam source, etc. The exhibits cover popular application areas such as micro-nano optics, acoustics, and medical fields. This Munich Shanghai Optical Expo will bring cutting-edge technologies and products to everyone, and we sincerely invite all new and old customers to take the time to visit our booth for discussions and exchanges!

Pengcheng's semiconductor glass substrate TGV technology supports advanced packaging.

In the field of advanced packaging, both interposers in 2.5D packaging and TSVs in 3D packaging are essential. Recently, many people have heard the term Through Glass Via (TGV). The potential of TGV is immense, and it may become a common feature in advanced packaging technology in the future. This article will briefly describe the applications and development trends of Through Glass Via (TGV) in advanced packaging, as well as an overview of the process.

Production-type TGV/TSV

The production-type TGV/TSV high vacuum magnetron sputtering coating machine is used for coating high-density through holes and blind holes on glass substrates and ceramic substrates, with a depth-to-diameter ratio greater than 10:1. For example, it is used for the substrate coating process of Cu/Ti microstructures and the deposition capability of Au/TiW transmission line dual system films, providing support for the enhancement of micro-system integration density.

Congratulations! We warmly congratulate Pengcheng Semiconductor on obtaining the national invention patent certificate.

Warm congratulations to Pengcheng Semiconductor for the invention patent "A Plug Valve and Vertical Double Chamber Hot Wire CVD System" being authorized by the National Intellectual Property Administration, and for receiving the national invention patent certificate on December 10, 2024.

Principle of Vacuum Coating Machine Equipment

The vacuum coating machine is an advanced surface treatment technology device that can form one or more layers of thin films on the surface of various materials, imparting new properties to the substrate, such as improved wear resistance, corrosion resistance, and optical performance. The working principle of the vacuum coating machine is mainly based on physical vapor deposition (PVD) technology, involving various physical processes such as vacuum technology, thermal evaporation, and sputtering.

Pengcheng Semiconductor Appears at the Fifth China New Materials Industry Development Conference in Wuhan

In Wuhan in the golden autumn of October, a grand gathering of the top wisdom in the field of new materials across the country and the world-the Fifth China New Material Industry Development Conference is about to kick off. The conference was grandly held from October 16th to 18th, 2024 at the China Che Gu International Sports and Cultural Exchange Center, Economic Development Zone, Wuhan City, Hubei Province. It was hosted by the Chinese Society of Materials Research and attracted many leaders in the new material industry. Among them, Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (referred to as "Pengcheng Semiconductor"), as a leader in the industry, will appear at the conference to showcase its latest achievements and technological innovations in the semiconductor field.

Features and functional advantages of plasma coating instrument

Plasma coating instrument is a kind of surface treatment equipment, which has a wide range of applications and important functional advantages. It is mainly used for surface coating and modification treatment. By exposing the material to a plasma environment, the modification and coating of the material surface can be achieved by utilizing the mechanisms of ion bombardment and reactive deposition. This technology has a wide range of applications in various industries, such as electronics, optoelectronics, medical, automotive and other fields.

The use of magnetron sputtering coating instrument and matters needing attention

Magnetron sputtering coating instrument (PVD coating equipment) is a common surface coating equipment. It is a technology that uses evaporation or sputtering to deposit thin films on the surface of a substrate under vacuum conditions to prepare metals, alloys, compounds, semiconductors, ceramics, dielectric composite films and other chemical reaction films. It is suitable for plating various single-layer films, multi-layer films, doped films and alloy films, and can be used for plating magnetic materials and non-magnetic materials. Widely used in electronics, optoelectronics, optics, medical and other industries. In order to ensure its normal use and obtain a good coating effect, the following are some details and techniques that need to be paid attention to when using the magnetron sputtering coating instrument.

Hot filament chemical vapor deposition (HFCVD) diamond coating equipment manufacturers "seismic information"

As an ultra-wide bandgap semiconductor material, diamond has excellent physical properties such as high carrier mobility, high thermal conductivity, high breakdown electric field, high carrier saturation rate and low dielectric constant, and is considered to be the "ultimate semiconductor" for the preparation of the next generation of high power, high frequency, high temperature and low power loss electronic devices ".

Definition and function of magnetron sputtering coating instrument

Magnetron sputtering coating instrument (PVD coating equipment) is an advanced surface treatment equipment, which has the characteristics of high efficiency. By using the magnetic field to control the motion trajectory of the ion beam, the sputtering adhesion to the surface of the material is achieved, so as to obtain high-quality thin film coating. The main function of the magnetron sputtering coater is to form a uniform, dense and good adhesion film layer on the surface of different materials to improve the hardness, wear resistance and corrosion resistance of the material. At the same time, it can also be used to change the optical properties, electrical properties and thermal conductivity of materials to meet the needs of different fields.