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Classification
Plasma etching equipment
PVD
CVD Scientific Instruments
LPCVD Low Pressure Chemical Vapor Deposition Equipment
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Vacuum high temperature CVD furnace
MOCVD Metal Organic Chemical Vapor Deposition Equipment
PECVD: Plasma-Enhanced Chemical Vapor Deposition
Small HFCVD Hot‑Filament Chemical Vapor Deposition System HITSemi-HFCVD-X
Inductor–Capacitor Hybrid 3D Plasma Cleaner HITSemi-Plasma-C
Small Plasma Cleaner (Capacitive) HITSemi-Plasma-C1
Small Plasma Cleaner (Inductive Type) HITSemi-Plasma-C2
Horizontal Vacuum Tube Furnace HITSemi-VTF-260
High-Vacuum Ultra-Clean Atmosphere Furnace HITSemi-VAF-1500
Organic Coating Equipment HITSemi-CVDP-X