Vacuum high temperature CVD furnace
The vacuum high temperature CVD furnace adopts the method of high temperature chemical vapor deposition to deposit various thin films on the surface of the workpiece, which is widely used in the semiconductor industry, including the deposition of large area insulating materials, as well as most metal materials and metal alloy materials, such as tantalum carbide coating and silicon carbide coating materials.
- Product Description
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vacuum high temperature CVD furnaceUsing high-temperature chemical vapor deposition method, a variety of thin films are deposited on the surface of the workpiece, which is widely used in the semiconductor industry, including the deposition of large-area insulating materials, as well as most metal materials and metal alloy materials, such as: tantalum carbide coating, silicon carbide coating materials.
For example, a tantalum carbide coating and a silicon carbide coating can be deposited on the surface of a graphite workpiece.
Applicable to production enterprises and major universities materials laboratory, research institutes, environmental science and other fields.
Equipment composition
The furnace shell is made of stainless steel, double-layer water-cooled structure, with observation window, infrared temperature measuring window and thermocouple temperature measuring device.
Heating system
A heater is installed inside the device to form a thin film deposition thermal field.
Sample stage system
The sample table can mount several workpieces at the same time.
Temperature measurement and heating power supply
1. Thermocouple/tungsten rhenium thermocouple/infrared thermometer is used for temperature control and detection.
2. The heating power supply is customized according to the actual requirements.
Main technical indicatorsType Parameters Power About 150KW Heater operating temperature ≤ 2200 ℃ vacuum degree 6.67*10-3Pa (cold no-load) Boost rate 0.08pa/h
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