Total trip system
The whole equipment is a cluster structure, which is composed of photoelectric conversion film deposition system, MAMS electronic stripping system, exhaust packaging system, getter material vacuum coating system and overall degassing system. Can realize the overall automatic coordination operation, can also be independent operation of each system, do not interfere with each other, can be set between the system interlock. 316 material manufacturing, reserved a number of flange interface.
- Product Description
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Project
Configuration and Metrics 1
overall structure The whole equipment is a cluster structure, which is composed of photoelectric conversion film deposition system, MAMS electronic stripping system, exhaust packaging system, getter material vacuum coating system and overall degassing system. Can realize the overall automatic coordination operation, can also be independent operation of each system, do not interfere with each other, can be set between the system interlock. 316 material manufacturing, reserved a number of flange interface. 2
System Control The equipment control system can realize stand-alone operation or online operation, and configure the upper computer for 1-to -6 layout. The specific control logic realizes interlocking, the operation interface is clear, and the process editing authority can be set. 3
Process flow Film loading-film transfer-determine growth conditions (beam current, substrate temperature)-deoxidation-stable substrate temperature-beam source heating-growth start-growth control-growth end-beam source temperature cooling-substrate temperature cooling-vacuum recovery-sample removal-film removal-vacuum recovery. 4
In-situ detection system Standard light source control 3100K or other color temperature, light source variable intensity, can achieve illumination information acquisition. Equipment overall potential control 0-500V, accuracy 1/1000, automatic short circuit protection. Photocurrent real-time acquisition 10nA ~ 10mA, automatic gear change, accuracy 1/1000.
With leakage slope trigger function.5
Heating source and power supply At least 3 metal compound positions and 1 metal elemental boat position, current control beam source rate, can achieve 0-10A output, continuously adjustable. Set overvoltage and overheat protection. 6
Electronic stripping parts The pole excitation current of the stripping source is 0-10A, continuously adjustable, the adjustment accuracy is 0.001A, and the maximum effective diameter of the effective area control is 35mm. Energy accuracy ± 0.1%@ diameter 35mm. Strength detection with overload alarm. 7
Vacuum system The equipment adopts double vacuum system of molecular pump group and cryopump group to meet the requirements of different processes. The working vacuum degree is less than or equal to 8*10-7pa, with protection before pump. 8
External Baking System The external baking temperature is less than or equal to 500 ℃, and the baking time is 24H. All parts of the equipment can adapt to the temperature for a long time. Temperature range,(RT)+80 ℃ ~ 500 ℃, display accuracy 0.1 ℃, temperature fluctuation ± 1.0 ℃, temperature uniformity ± 2.0 ℃%, heating time 25 ℃ ~ 400 ℃ about 90 minutes.
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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