Application of Magnetron Sputtering Technology in the Preparation of Core Thin Films for Key Components in Medical Imaging


Release time:

2026-01-28

In the ongoing evolution of modern medical imaging technology, magnetron sputtering has become a core process in the field of thin-film fabrication and is widely used in the manufacturing of critical components for medical imaging.

In modern times Medical Imaging In the continuous evolution of technology, Magnetron sputtering Technology has become Thin-film preparation The core technology of the field is widely used in the manufacturing process of critical components for medical imaging.

Magnetron sputtering technology, as an advanced... Physical Vapor Deposition (PVD) PVD ) The process involves a sputtering procedure carried out in a vacuum environment. This technology precisely controls the trajectories of charged particles using magnetic fields, enabling more accurate and uniform sputter deposition. It excels particularly in the field of thin-film fabrication, allowing it to provide high-quality, high-performance thin-film materials for medical imaging devices.

In the field of medical imaging, film quality directly determines image clarity and device performance. Thin films fabricated using magnetron sputtering technology exhibit excellent adhesion, density, and uniformity, fully meeting the stringent standards required for medical imaging devices. Whether it’s optical lenses, sensors, or other core components, this technology can provide an ideal thin-film solution.

Advanced PVD Equipment As the core platform for magnetron sputtering technology, we integrate advanced process technologies with exceptional manufacturing capabilities. Our R&D team continuously innovates and is committed to delivering efficient and stable equipment solutions. These devices not only feature high levels of automation and intelligence but can also be custom-designed to meet specific customer requirements, thereby satisfying the production needs of various medical imaging components.

Employing magnetron sputtering technology and specialized... PVD Equipment means obtaining high-quality, high-performance technical support. Given the medical imaging industry’s stringent requirements for product quality and performance, premium services and technical support will become crucial enablers for companies to win market share and create value.

In summary, magnetron sputtering technology plays an irreplaceable role in the preparation of thin films for critical components in medical imaging. Choose a professional... PVD Equipment and technology service providers will become a core factor in enhancing the competitiveness of medical imaging manufacturers.

News Center

Pengcheng Semiconductor Leads the Future: Explosive Growth of TGV and TSV Technologies on the Horizon

With the rapid development of the semiconductor industry, especially in the field of chip interconnect technologies, through-glass vias (TGV) technology is increasingly becoming a key driver of growth. In the near future, this technology is expected to usher in unprecedented growth opportunities in both the global and Chinese markets. According to the latest market research data, China has already become the world’s largest market for TGV technology applications.

Application of Magnetron Sputtering Technology in the Preparation of Core Thin Films for Key Components in Medical Imaging

In the ongoing evolution of modern medical imaging technology, magnetron sputtering has become a core process in the field of thin-film fabrication and is widely used in the manufacturing of critical components for medical imaging.

Pengcheng Semiconductor Achieves a New Breakthrough in Magnetron Sputtering Technology, Boosting the Localization of High-End Vacuum Coating Equipment.

Shenzhen—Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as "Pengcheng Semiconductor"), which has been deeply engaged in the fields of advanced semiconductor packaging and micro- and nano-manufacturing, recently announced a significant technological breakthrough in its independently developed high-vacuum magnetron sputtering coating equipment. The equipment has successfully achieved high-density via plating with a depth-to-diameter ratio exceeding 10:1 in TGV (Through Glass Via) coating processes, injecting new momentum into the development of domestically produced vacuum coating equipment in the field of three-dimensional integration.

Principles, Classification, and Applications of Physical Vapor Deposition (PVD) Technology

Physical Vapor Deposition (PVD) is an advanced surface engineering technology that, under vacuum conditions, uses physical methods to convert a target material into gaseous atoms, molecules, or ions, which then deposit onto the substrate surface to form a thin film. Since its development in the early 20th century, PVD technology has become a crucial technique in modern additive manufacturing and functional coating applications, owing to its advantages such as environmental friendliness, controllable costs, minimal consumable usage, dense and uniform film properties, and strong adhesion between the film and substrate. PVD enables the on-demand preparation of functional films with properties including wear resistance, corrosion resistance, conductivity, insulation, piezoelectricity, and magnetism, and is widely used across various industries, including mechanical, electronic, construction, and medical sectors.

The TGV glass through-hole technology has achieved a significant breakthrough, and its application prospects continue to expand.

Recently, TGV (Through Glass Via) technology has made significant strides in the fields of materials processing and micro- and nano-manufacturing, drawing considerable attention from the semiconductor, advanced packaging, and emerging electronic device industries. With its outstanding electrical performance, high-frequency characteristics, and three-dimensional integration capabilities, TGV is emerging as one of the key technologies for next-generation high-density interconnects.