Pengcheng Semiconductor Achieves a New Breakthrough in Magnetron Sputtering Technology, Boosting the Localization of High-End Vacuum Coating Equipment.


Release time:

2026-01-16

Shenzhen—Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as "Pengcheng Semiconductor"), which has been deeply engaged in the fields of advanced semiconductor packaging and micro- and nano-manufacturing, recently announced a significant technological breakthrough in its independently developed high-vacuum magnetron sputtering coating equipment. The equipment has successfully achieved high-density via plating with a depth-to-diameter ratio exceeding 10:1 in TGV (Through Glass Via) coating processes, injecting new momentum into the development of domestically produced vacuum coating equipment in the field of three-dimensional integration.

Shenzhen—Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as “Pengcheng Semiconductor”), which has been deeply engaged in the fields of advanced semiconductor packaging and micro- and nano-manufacturing, recently announced that its independently developed... High-vacuum magnetron sputtering coating equipment A major technological breakthrough has been achieved in the TGV (Through-Glass Via) coating process, successfully enabling high-density via coating with a depth-to-diameter ratio exceeding 10:1. This breakthrough injects new momentum into the development of domestically produced vacuum coating equipment in the field of three-dimensional integration.

Leading the industry with core technology

As a leading domestic supplier of semiconductor process equipment, Pengcheng Semiconductor has leveraged the research strength of Harbin Institute of Technology (Shenzhen) and the industry experience of its seasoned engineering team to establish a comprehensive product portfolio in the field of magnetron sputtering technology. Its flagship product— Production-grade TGV/TSV/TMV high-vacuum magnetron sputtering coating system (Sputter-2000W series) Specifically designed for high-density through-hole and blind-hole plating on glass and ceramic substrates, this technology enables precise fabrication of dual-layer films such as Cu/Ti microstructures and Au/TiW interconnects, significantly enhancing the integration density of microsystems.

This technology represents a high-end application of PVD (Physical Vapor Deposition) processes. In a vacuum environment, high-energy particles bombard a target material, thereby depositing a dense, high-purity thin film onto the substrate surface. Pengcheng Semiconductor Equipment features programmable automated control and boasts outstanding advantages such as excellent film uniformity, superior repeatability, and strong adhesion. It can stably produce a wide variety of material systems, including metal, alloy, compound, semiconductor, ceramic, and dielectric composite films.

Vacuum technology builds the cornerstone of quality.

“Vacuum technology is the core prerequisite for ensuring film quality,” emphasized the head of Pengcheng Semiconductor Technology. The company’s equipment provides an ultra-high vacuum environment during epitaxial film growth, effectively eliminating interfering factors during the deposition process and guaranteeing the production of high-precision films with ideal characteristics. By optimizing key technologies such as vacuum acquisition techniques, control of gas molecule movement paths, and vacuum magnetohydrodynamic sealing, Pengcheng Semiconductor has not only improved its pumping efficiency but also significantly extended the continuous operating time of its equipment, thereby greatly boosting production efficiency.

Wide application prospects

Thin films prepared by magnetron sputtering exhibit outstanding performance in electrical, optical, thermal, and mechanical properties, and are widely used in fields such as integrated circuits (ICs), power devices, semiconductor lighting LEDs, advanced packaging, medical devices, new energy technologies, and aerospace. In particular, in the TGV glass through-hole technology, magnetron-sputtered coatings enable vertical interconnections of three-dimensional circuits, significantly enhancing the integration density and high-frequency performance of electronic devices.

As the semiconductor industry moves toward higher density and three-dimensional integration, the demand for deep-hole plating technology is becoming increasingly urgent. Pengcheng Semiconductor’s vacuum coating equipment is emerging as a crucial domestically produced alternative that addresses this critical bottleneck.

Continuous Innovation and Market Expansion

Pengcheng Semiconductor not only focuses on technological R&D but also actively promotes industrialization. The company has obtained ISO9001 quality management system certification, marking the implementation of standardized management across its entire value chain—from production and research to sales. Recently, the company participated in major industry events such as the National Semiconductor Conference and the China New Materials Industry Development Conference, showcasing its latest vacuum coating equipment solutions. Additionally, Pengcheng Semiconductor has established deep collaborations with research institutions both at home and abroad.

“It is our mission to ensure that every user can access domestically developed, independently researched and designed vacuum coating equipment,” said the head of Pengcheng Semiconductor. “In the future, we will continue to increase our investment in core areas such as magnetron sputtering and vacuum technology, providing solid equipment support for the high-quality development of China’s semiconductor industry.”

About Pengcheng Semiconductor

Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. was co-founded by Harbin Institute of Technology (Shenzhen) and a team of seasoned engineers. The company is dedicated to micro- and nano-technologies and high-end precision manufacturing. Its specific application areas include the R&D and design, production and manufacturing, process technology services, and upgrade and retrofitting of equipment for semiconductor and broad-spectrum semiconductor materials, processes, and equipment. The company can also provide customers with process R&D and prototyping services.

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Pengcheng Semiconductor Achieves a New Breakthrough in Magnetron Sputtering Technology, Boosting the Localization of High-End Vacuum Coating Equipment.

Shenzhen—Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as "Pengcheng Semiconductor"), which has been deeply engaged in the fields of advanced semiconductor packaging and micro- and nano-manufacturing, recently announced a significant technological breakthrough in its independently developed high-vacuum magnetron sputtering coating equipment. The equipment has successfully achieved high-density via plating with a depth-to-diameter ratio exceeding 10:1 in TGV (Through Glass Via) coating processes, injecting new momentum into the development of domestically produced vacuum coating equipment in the field of three-dimensional integration.

Principles, Classification, and Applications of Physical Vapor Deposition (PVD) Technology

Physical Vapor Deposition (PVD) is an advanced surface engineering technology that, under vacuum conditions, uses physical methods to convert a target material into gaseous atoms, molecules, or ions, which then deposit onto the substrate surface to form a thin film. Since its development in the early 20th century, PVD technology has become a crucial technique in modern additive manufacturing and functional coating applications, owing to its advantages such as environmental friendliness, controllable costs, minimal consumable usage, dense and uniform film properties, and strong adhesion between the film and substrate. PVD enables the on-demand preparation of functional films with properties including wear resistance, corrosion resistance, conductivity, insulation, piezoelectricity, and magnetism, and is widely used across various industries, including mechanical, electronic, construction, and medical sectors.

The TGV glass through-hole technology has achieved a significant breakthrough, and its application prospects continue to expand.

Recently, TGV (Through Glass Via) technology has made significant strides in the fields of materials processing and micro- and nano-manufacturing, drawing considerable attention from the semiconductor, advanced packaging, and emerging electronic device industries. With its outstanding electrical performance, high-frequency characteristics, and three-dimensional integration capabilities, TGV is emerging as one of the key technologies for next-generation high-density interconnects.

Application of TGV Glass Through-Hole Technology in Magnetron Sputtering

As an advanced micro- and nano-fabrication technique, TGV glass via-hole technology has demonstrated tremendous application potential in the field of magnetron sputtering. By precisely fabricating vias on glass substrates, this technology not only enables vertical interconnections for three-dimensional circuits but also significantly enhances the integration and performance of electronic devices.

Diamond: Possessing potential that surpasses existing semiconductor materials, with broader application prospects in the future.

Diamond is used as a semiconductor material—and some scholars even hail it as the “ultimate semiconductor material” and the “ultimate room-temperature quantum material”—owing to its unique physical and chemical properties. Diamond is an ultra-wide-bandgap semiconductor that boasts exceptional electrical, optical, mechanical, thermal, and chemical characteristics. These properties give diamond broad application prospects in numerous fields.