Micro nano technology and high-end precision manufacturing
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Semiconductor field
Manufacturers of R & D, design and production of semiconductor materials, engineering and equipment
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Industrial/research grade thin film deposition equipment
R & D, design and production manufacturers of semiconductor materials and devices, micro-nano materials and devices, and advanced precision manufacturing technologies
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Development and production of micro-and nano-crystalline diamond films
Large-size diamond polycrystalline wafers for high-power devices,
Heat sink of high frequency device and high power laser
Advanced semiconductor material supplier based on autonomous equipment
PECVD plasma enhanced chemical vapor deposition equipment is mainly used in
Thin film growth of silicon nitride and silicon oxide in clean vacuum environment
Product
The whole equipment is a cluster structure, which is composed of photoelectric conversion film deposition system, MAMS electronic stripping system, exhaust packaging system, getter material vacuum coating system and overall degassing system. Can realize the overall automatic coordination operation, can also be independent operation of each system, do not interfere with each other, can be set between the system interlock. 316 material manufacturing, reserved a number of flange interface.
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Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine
Production-type TGV/TSV/TMV high-vacuum magnetron sputtering coating machine (Sputter-2000W series). This equipment is used for coating high-density through-holes and blind holes in glass and ceramic substrates, with an aspect ratio >10:1.
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MBE Molecular Beam Epitaxy Equipment
Molecular Beam Epitaxy (MBE) equipment can achieve epitaxial growth processes on certain substrates, enabling molecular self-assembly, superlattices, quantum wells, one-dimensional nanowires, and more. It can be used for process verification and the growth and manufacturing of epitaxial wafers for both second-generation and third-generation semiconductors. The MBE equipment provides an ultra-high vacuum environment during thin film epitaxial growth, creating an ideal setting for this process. It effectively eliminates various interference factors during film growth, resulting in high-precision thin films.
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HFCVD hot filament chemical vapor deposition equipment
Research and development design and manufacture of hot filament CVD diamond equipment, divided into experimental equipment and production equipment two categories. The equipment is mainly used for R & D and production of micro-crystalline and nano-crystalline diamond films. Can be used for mechanical level, thermal level, optical level, acoustic level of diamond products development and production. It can be used to manufacture large-size diamond polycrystalline wafers for high-power devices, high-frequency devices and heat sinks for high-power lasers.
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About Us
Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd.
By the Harbin Institute of Technology (Shenzhen) and has many years of practical experience in the team of engineers to jointly initiate the creation.
Based on the intersection of technology frontier and market frontier, the company seeks innovation and sustainable development, solves the pain points of the industry and the problem of localization, and strives for the independent control of the industrial chain. The company's core business is micro-nano technology and high-end precision manufacturing, specific application areas include semiconductor materials, semiconductor technology and semiconductor equipment research and development design and manufacturing. The company's talent team has a complete knowledge structure, including a high-level material research and process research team with professors and doctors of Harbin Institute of Technology as the core, and a team of senior equipment designers from the industry. they have more than 20 years of experience in semiconductor material research, epitaxial technology research and semiconductor film preparation equipment design, production and manufacturing. Relying on Harbin Institute of Technology (Shenzhen), the company has advanced semiconductor R & D equipment platform and testing equipment platform, and can carry out scientific research work from a high starting point. Headquartered in Shenzhen, the company has the ability to develop, produce and debug semiconductor equipment, as well as pilot, production and sales of semiconductor materials and devices.
Further understandingCompany establishment time
technology patent
technology accumulation
Customer Service
Laboratory and R & D Center
Relying on the complete experimental platform and test analysis platform of Harbin Institute of Technology (Shenzhen), it provides support for R & D and production.
News
2025-05-23
2025-05-21
Thin film deposition equipment
2025-04-30
2025-04-24
Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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