HFCVD Hot-Wire Chemical Vapor Deposition Equipment
We have developed and manufactured hot-filament CVD diamond equipment, which is divided into two categories: experimental models and production models. These devices are primarily used for the research and development and production of micrometer- and nanometer-sized diamond films. They can be applied to the R&D and production of diamond products across various technical levels, including mechanical, thermal, optical, and acoustic applications. We can also produce large-size polycrystalline diamond wafers, which are suitable for use as heat sinks in high-power devices, high-frequency devices, and high-power lasers.
- Product Description
-
We have developed, designed, and manufactured hot-filament CVD diamond equipment, which is divided into two categories: experimental models and production-grade equipment.
The equipment is primarily used for the research and development and production of microcrystalline and nanocrystalline diamond films. It can be applied to the R&D and production of diamond products across mechanical, thermal, optical, and acoustic performance levels.
Large-size polycrystalline diamond wafers can be manufactured for use as heat sinks in high-power devices, high-frequency devices, and high-power lasers.
Diamond products suitable for producing corrosion-resistant, wear-resistant, and hard coatings; diamond products used in wastewater treatment in the environmental protection field.
It can be used for preparing diamond films on flat workpieces, as well as for depositing hard diamond coatings on tool surfaces or other irregular surfaces.
Can be used for the research and development and production of solar thin-film batteries.Workpiece dimensions
Dimensions of the circular flat workpiece: maximum φ600mm.
The width of the rectangular workpiece shall be ≤600mm.The length dimension of the rectangular workpiece can be determined based on the length of the coating chamber (e.g., workpiece length: 1200 mm).
Configure the water-cooled sample stage.
It can be coated on one side or on both sides.
Diamond Film Production Line
Heating filament power supply wattage
Up to 300 kW, with adjustable power ranging from 1 kW to 300 kW (the power range can be configured according to the user’s process requirements).
Device security
- Detection and Protection of Power Systems
- Set up vacuum detection and alarm protection functions
- Pressure and flow detection, as well as alarm and protection functions for the cooling water circulation system.
- Install a water pressure detection and alarm protection device
- Install a water flow detection and alarm device
Hot-filament CVD diamond equipment
Equipment Composition
Vacuum chamber configuration
Double-layer water-cooling structure, available in vertical circular, vertical D-shaped, vertical rectangular, and horizontal rectangular designs, with front and rear doors.Vacuum size: Determined based on the dimensions and quantity of the workpiece.
Heated wire
Heating filament materials: tantalum wire or tungsten wire
Heating filament temperature: 1800℃ to 2500℃, adjustable
The heating wire doesn't sag (solving the problem of the heating wire sagging after prolonged heating).
Sample stage
It is water-cooled, capable of applying bias voltage, rotatable, and height-adjustable. Controlled by a speed-regulating motor, it can achieve automatic height adjustment (the distance between the hot filament and the substrate is adjustable within the range of 5 to 100 mm). The adjustment must be smooth, with vertical fluctuations no greater than 0.1 mm.
Working gas path (CVD)
The working gas path is configured according to the user’s process requirements:
The following gas configuration is a configuration case for a specific user.
H 2 (5000 sccm, concentration 100%)
CH 4 (200 sccm, concentration 100%)
B 2 H 6 (50 sccm, H) 2 Concentration 99%)
Ar (1000 sccm, concentration 100%)
Vacuum Generation and Measurement System
Control System and Software
Key words:
Get Quote