HFCVD hot filament chemical vapor deposition equipment
Research and development design and manufacture of hot filament CVD diamond equipment, divided into experimental equipment and production equipment two categories. The equipment is mainly used for R & D and production of micro-crystalline and nano-crystalline diamond films. Can be used for mechanical level, thermal level, optical level, acoustic level of diamond products development and production. It can be used to manufacture large-size diamond polycrystalline wafers for high-power devices, high-frequency devices and heat sinks for high-power lasers.
- Product Description
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Research and development design and manufacture of hot filament CVD diamond equipment, divided into experimental equipment and production equipment two categories.
The equipment is mainly used for R & D and production of micro-crystalline and nano-crystalline diamond films. Can be used for mechanical level, thermal level, optical level, acoustic level of diamond products development and production.
It can be used to manufacture large-size diamond polycrystalline wafers for high-power devices, high-frequency devices and heat sinks for high-power lasers.
Can be used in the production of anti-corrosion wear-resistant hard coating; environmental protection field of sewage treatment with diamond products.
It can be used for the preparation of diamond films for planar workpieces, and can also be used for the preparation of diamond hard coatings on tool surfaces or other irregular surfaces.
It can be used in the development and production of solar thin film cells.Workpiece size
Size of circular plane work: maximum φ600mm.
The width 1000mm/length of the rectangular working size can be determined according to the length of the coating chamber (e. g. workpiece length 1500mm).
Configuration of water-cooled sample table.
Can be single-sided coating can also be double-sided coating.
Diamond film production line
Hot wire power
Up to 300KW,1KW ~ 300KW adjustable (power range can be configured according to user process requirements)
Device security
-Detection and protection of power systems
-Set vacuum detection and alarm protection function
-Cooling circulating water system pressure detection and flow detection and alarm protection
-Set water pressure detection and alarm protection device
-Set water flow detection alarm device
Hot filament CVD diamond equipment
Equipment composition
Vacuum chamber composition
Double-layer water-cooled structure, vertical round, vertical D-shaped, vertical rectangular, horizontal rectangular, front and rear doors, vacuum size, determined according to the size and quantity of the workpiece.
hot wire
Hot wire material: tantalum wire, or tungsten wire
Hot wire temperature: 1800 ℃ ~ 2500 ℃ adjustable
Hot wire does not collapse (solve the problem of long-term heating of hot wire collapse).
Sample table
It can be water-cooled, biased, rotatable, liftable, controlled by a speed regulating motor, and can realize automatic lifting (the distance between the hot wire and the substrate is adjustable within the range of 5~100mm). It is required to lift smoothly and fluctuate up and down not more than 0.1mm.
Working gas circuit (CVD)
The working gas circuit is configured according to the user's process requirements:
The following gas configuration is a configuration example for a user.
H2(5000sccm, concentration 100%)
CH4(200sccm, concentration 100%)
B2H6（50sccm，H2Concentration 99%)
Ar(1000sccm, concentration 100%)
Vacuum acquisition and measurement system
Control system and software
Key words:
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Contact: Miss Dai
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Telephone:13632750017
E-mail:sales@hitsemi.com
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