EB plasma assisted deposition equipment
- Product Description
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Project
Configuration and Metrics 1
overall structure Box-type vertical, right front door opening, inner cavity size φ900mm × 1480mm, inner and outer electrolytic polishing. The outer wall is water-cooled, multi-flange interface is reserved, the main frame is made of section steel, and a partition is arranged between the main pump. The electrical component installation cabinet is a longitudinal large plate structure with a sheet metal package appearance. 2
System Control Touch screen and PLC central control mode are adopted, and relevant electrical control units are used to monitor and control the equipment vacuum system, evaporation source system, workpiece rotation system, film thickness monitoring system, etc. Automatic sound and light alarm and protection system for water, electricity and gas faults are provided, and manual and automatic control modes can be switched. 3
Vacuum system The vacuum is equipped with dry pump, Roots pump and condensate pump. The overall pumping speed is 5 × 10-6 Torr for less than 30min, the ultimate vacuum degree is 2 × 10-7 Torr, and the leakage rate is better than 5E-5Torr L/S. The combination of Pirani and ionization vacuum gauge monitors the vacuum degree. 4
workpiece rack system The whole umbrella-type workpiece frame can be adjusted at 0-20 revolutions per minute, and the radial runout is 2mm. The whole umbrella type stainless steel coated umbrella has a thickness of 3mm and can load 6 8-inch substrates. 5
Baking system Under the baking mode, iodine tungsten lamp heating, temperature range of RT-450 ℃,PID automatic temperature control, temperature uniformity RT -450 ℃ 5 ℃, temperature controller control accuracy of 1 ℃. 6
electron beam evaporation source Maximum power 10KW, E-type electron gun, equipped with a set of 4 x 25cc crucible, crucible bottom driver control, wired remote control beam spot rotation angle and starting position, plug-in baffle, bottom cylinder drive, all electron gun gas standby. 7
plasma source Self-made high-output cathode ion source, maximum current 10A, maximum voltage 300V, automatic start and stop, long-term continuous and stable work for more than 100 hours, three-way process gas. 8
film thickness control system The six-probe quartz crystal film thickness meter and the corresponding control system can systematically control the evaporation rate of the evaporation source, the evaporation source baffle, the material inflation, the rotation of the electron gun crucible, and at the same time can realize the automatic vacuum and automatic coating process. 9
Guarantee demand The maximum power of the equipment is about 50KW. Independent ground wire of electron gun, grounding resistance ≤ 4Ω.
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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