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MAMS Electronic Scrubbing System

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  • Product Description
  • Project

    Configuration and Metrics

    1

    process chamber andLOAD LOCK
    The process chamber and LOAD LOCK are made of 304 stainless steel, both inside and outside are electrolytically polished, the front door is opened, and multiple flange openings are reserved for the sputtering chamber.

    2

    System Control
    The system control cabinet supplies power to all components through the power distribution box, and the heater is equipped with protection device and safety interlock. The computer host is an industrial control touch screen with three levels of authority, and the operation data and process data of each module of the equipment are visualized.

    3

    Vacuum system
    The vacuum is equipped with scroll dry pump and molecular pump, with pumping speed of 35m 3/h and 60 m 3/h, process limit vacuum ≤ 3E-8 Torr, and LOAD LOCK limit vacuum ≤ E-7Torr. Pirani wide range vacuum gauge combination test vacuum, range from atmospheric to 5E-10Torr.

    4

    magnetron sputtering deposition source
    Optional DC, DC/pulse, RF power supply and switch. Substrate stages A and B are both suspension substrate stages that can be biased, A sputtering upward, B sputtering downward, and continuous autobiography at 0-20rpm.

    5

    Process Control
    The film thickness control accuracy of the process chamber is 0.01A/s, the film thickness uniformity is ≤ 5%, the heating temperature is RT-600 ℃, and the PID temperature control accuracy is +/-1 degree. The process tooling is an 8-inch platform, suitable for single wafer, compatible with chips and Mask alignment.

    6

    ion source,Electronic brushes, light sources and probes
    Ion source for substrate cleaning or assisted deposition,With 4CM ion source and all the way gas. The diameter of the spot area of the self-made electronic brush beam is 40mm, and the area is cleaned by electronic scanning. The self-made light source is used to irradiate the surface of the film to assist in detecting the light transmittance of the film. The probe detects the number of electrons generated by the light source and the direction of the current in the film on-line.

    7

    Equipment support and tooling
    Adopt aluminum profile structure bracket, with ground wheel and anchor.

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