Production-type high vacuum magnetron sputtering/ion-assisted/multi-arc composite coating machine
Production-type high vacuum magnetron sputtering/ion-assisted/multi-arc composite coating machine (PVD-1000S series) is widely used for the preparation of hard wear-resistant coatings on surfaces such as milling cutters, drill bits, bearings, gears, and lenses. It integrates various process methods including workpiece surface treatment, ion cleaning, particulate control, magnetron sputtering, ion-assisted coating, and reactive sputtering coating into a single PVD device.
Classification:
- Product Description
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Production-type high vacuum magnetron sputtering/ion-assisted/multi-arc composite coating machine (PVD-1000S series)This equipment is widely used for the preparation of hard wear-resistant coatings on surfaces such as milling cutters, drill bits, bearings, gears, and lenses. It integrates various process methods including workpiece surface treatment, ion cleaning, particulate control, magnetron sputtering, ion-assisted coating, and reactive sputtering coating into a single PVD device.
It can prepare single-layer films, multi-layer films, doped films, metal films and alloy films, compound films, etc.
Equipment structure and performance parameters
The equipment consists of a PVD coating chamber, integrated closed cabinet, molecular pump + rotary vane pump vacuum unit, vacuum measurement system, process gas path system, magnetron sputtering target, linear ion source, workpiece rack, target baffle, workpiece rotation mechanism, pulsed DC power supply, high-energy pulsed power supply, intermediate frequency power supply, radio frequency power supply, bias power supply, ion-assisted coating power supply and control system, detection and alarm protection system, water cooling pipeline system, circulating refrigeration constant temperature water tank, computer + PLC two-level control system.
- Overall dimensions: 2500mm X 2500mm X 2000mm. Can also be customized according to user production capacity.
- The magnetron sputtering target is rectangular with a target surface size of 80mm X 300mm. It is arranged along the circumference of the vacuum chamber wall and can adjust the distance between the target surface and the sample online at any time. The target head has a retractable distance of 150mm. The target surface size can also be adjusted according to the workpiece size.
- The linear ion source is arranged along the circumference of the vacuum chamber wall with two sets. The working gas pressure is 0.1-0.3Pa with adjustable energy from 200-5000eV and beam current intensity of 0.2-1A.
- The workpiece rack has a cylindrical structure with a planetary distribution. Workpieces are arranged along the circumference with each workpiece rotating and revolving. It has a large sample loading capacity; the rotational motion runs smoothly without shaking; sealing is reliable.
- Workpieces can be biased.
- The heating system uses infrared heaters that are pollution-free in a vacuum environment and provide uniform heating; an intelligent temperature controller with PID function controls the heating power. Workpieces can be heated up to 500 degrees Celsius.
Key performance parameters of the equipment
Ultimate vacuum degree
7X10-5Pa
Working background vacuum degree 8X10-4Pa Time to reach working background vacuum <30min (under conditions of air humidity below 45%; time from atmosphere to working vacuum <30min) Pressure holding Shutdown for 12 hours pressure holding <10Pa Sputtering chamber dimensions Diameter 875mm X Height 1000mm Overall dimensions Length 2500mm X Width 2500mm X Height 2000mm Sample heating temperature Room temperature ~500℃ Sample rack revolution speed 0; continuously adjustable from 3~12r/min Uniformity of film layer within the piece <5% Uniformity of film layer between pieces <5% Number of magnetron targets 4 targets (can be expanded according to user process) Linear ion source 2 targets Specifications of magnetron targets 80mm X 300mm Specifications of target materials 80mm X 100mm X 8mm
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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