Production-type high vacuum magnetron sputtering and ion-assisted composite coating machine
Production-type high vacuum magnetron sputtering and ion-assisted composite coating machine (PVD-1000B series) uses magnetron sputtering, ion assistance, and reactive sputtering processes to prepare various thin film materials on the surface of workpieces. This equipment integrates surface treatment, ion cleaning, particulate control, magnetron sputtering, ion-assisted coating, and reactive sputtering coating processes into one PVD device.
Classification:
- Product Description
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Production-type high vacuum magnetron sputtering and ion-assisted composite coating machine (PVD-1000B series)This equipment uses magnetron sputtering, ion assistance, and reactive sputtering processes to prepare various thin film materials on the surface of workpieces. It integrates surface treatment, ion cleaning, particulate control, magnetron sputtering, ion-assisted coating, and reactive sputtering processes into one PVD device.
It can prepare single-layer films, multi-layer films, doped films, metal films, alloy films, and compound films.
Equipment structure and performance parameters
The vacuum chamber is cylindrical with an upper opening cover and a front-opening door structure; all materials used are austenitic stainless steel 304/321, with surface electrochemical polishing treatment, no microscopic burrs, and will not harbor dirt.
The magnetron sputtering target is rectangular and arranged along the circumference of the vacuum chamber wall, with adjustable distance between the target surface and the workpiece.
The sample holder is cylindrical with a large sample loading capacity; the rotation motion is gear-driven, with direct power input connected to the gear-driven sample table rotating smoothly without shaking; it has reliable sealing and low failure rate.
The heating system uses infrared heaters, which are pollution-free in a vacuum environment and provide uniform heating; it employs an intelligent temperature controller with PID function to control heating power.
The electrical control and operating system work stably and reliably, with a clear and elegant operating interface that is easy to use.
The system has complete safety protection settings, allowing for unmanned operation after the equipment starts.
Key performance parameters of the equipment
Ultimate vacuum degree
8X10-5Pa
Working background vacuum degree 8X10-4Pa Time to reach working background vacuum <40min (under conditions of air humidity below 45%; time from atmospheric pressure to working vacuum when door opening time <30min) Sample heating temperature Room temperature ~300℃
Sample holder revolution speed 3~10r/min continuously adjustable Uniformity of film layer within the wafer <5% Uniformity of film layer between wafers <5% Number of magnetron targets 3 targets (can be expanded according to user process requirements) Vacuum cleaning ion target 1 target Specifications of magnetron targets 180mm X 650mm Specifications of target materials 120mm X 120mm X 8mm
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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