TSV Technology: A Core Pillar of AI Computing Power


Release time:

2026-07-01

To establish a high‑bandwidth data‑transfer backbone for AI chips and sustain continuous gains in computing power, a fundamental underlying technology—TSV (Through‑Silicon Via)—is essential. TSV stands for Through‑Silicon Via, or silicon‑through‑via technology in Chinese. In essence, it creates vertical vias within a silicon wafer and fills them with conductive material, thereby forming a dense, vertically oriented electrical interconnect between the top and bottom surfaces of the wafer. This enables interchip connectivity and is one of the key enabling technologies for 2.5D and 3D packaging.

The explosive growth of ChatGPT and multimodal large models has made AI computing power the most closely watched central topic in the tech industry. As the computational capacity of AI chips grows exponentially, a key bottleneck is becoming increasingly apparent: the processing speed of compute units far outpaces the data‑transfer rate of memory, causing vast amounts of computing power to sit idle while waiting for data and reducing overall utilization—a phenomenon commonly referred to as the “memory wall.” To unblock the critical data‑transfer pathways within AI chips and sustain further leaps in computing performance, we need breakthroughs in the underlying foundational technologies embedded at the chip level— TSV silicon through-silicon via 。

What is TSV?

TSV stands for Through-Silicon Via. , translated into Chinese as Through-Silicon Via Technology In simple terms, it creates vertical vias in the silicon wafer and fills them with conductive material, thereby establishing a high-density, vertical electrical interconnect between the top and bottom surfaces of the wafer, enabling inter-chip connectivity. It is… 2.5D/3D packaging One of the key process technologies.

Traditional planar wiring in chips forces signals and data to snake along two-dimensional “roads,” resulting in slow transmission, congestion, and high power consumption. In contrast, TSV technology is like building countless vertical elevators inside the chip, enabling signals to pass directly through the silicon wafer and connect between layers. This drastic reduction in interconnect distances—from the millimeter scale down to the micrometer scale—not only significantly lowers transmission latency but also achieves higher interconnect density and lower power consumption, making it currently… 3D chip interconnects The core technical solution. TSV technology has been widely adopted across various fields, such as… CIS (CMOS image sensor) and 3D IC stacked packaging Wait.

Why is TSV said to underpin AI computing power?

The training and inference of large AI models are, at their core, high‑speed computations and throughput operations on massive datasets, placing stringent demands on memory bandwidth. Without… High-Bandwidth Memory HBM Even with exceptionally powerful GPU computing capabilities, insufficient data supply can lead to underutilization, resulting in significant computational resources being wasted.

At the heart of HBM’s performance breakthrough lies TSV technology. By leveraging a 3D‑stacked architecture, HBM simultaneously achieves both high bandwidth and large capacity, with TSV serving as the critical interconnect backbone of this stacked design: it creates micron‑scale vertical conductive vias in silicon wafers, enabling multiple layers of DRAM chips to be vertically stacked and electrically interconnected with exceptional efficiency. This vertical interconnection dramatically reduces signal‑transmission distances between stacked dies, while advanced packaging techniques tightly integrate memory with compute units, delivering higher channel density and faster data rates—precisely the optimal solution for overcoming the “memory wall” bottleneck in AI accelerators.

Pengcheng Semiconductor’s production‑grade TGV/TSV/TMV high‑vacuum magnetron sputtering coating system

Future Outlook

The evolution of AI is far from over; each leap in computing power places ever more demanding requirements on TSV technology. Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as “…”) Pengcheng Semiconductor “With deep, long-term expertise in micro‑ and nano‑technologies and high‑end precision manufacturing, we continuously advance key areas such as TSV‑based advanced packaging, striving to provide the semiconductor industry with reliable technological and equipment support and to forge robust vertical interconnect pathways that underpin AI computing power. Backed by a solid foundation of cutting‑edge process technologies, we will keep driving the evolution of computing performance, injecting sustained momentum into the high‑quality development of China’s semiconductor sector.”

 

 

Disclaimer:

This article is partially reprinted from the internet; the copyright and responsibility for its content belong to the original author. If you are the original author and do not wish your work to be reproduced, please contact us at sales@hitsemi.com.

News Center

How does an electron beam “deposit” a thin film onto a material in a vacuum?

The performance of modern devices depends largely on thin films. Though these films may be only tens to hundreds of nanometers thick, they determine whether a chip conducts electricity, whether a lens transmits light, and whether a device can withstand high temperatures. How is such a film “deposited”? One answer lies in high‑vacuum electron‑beam evaporation coating.

The 27th CIOE China Optics Expo Concludes | A Retrospective on Pengcheng Semiconductor’s Participation

On September 11, 2026, the 27th China International Optoelectronics Exposition (CIOE) successfully concluded at the Shenzhen International Convention and Exhibition Center. Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as “Pengcheng Semiconductor”) showcased its core equipment—PVD coating systems and CVD coating systems—along with complementary process solutions at the event.

The 27th CIOE China Optoelectronics Expo is set to open, as we join Shenzhen Semiconductor in embarking on a new journey in micro- and nano-manufacturing.

From September 9 to 11, 2026, the 27th CIOE China Optics Expo will open with great fanfare! Pengcheng Semiconductor will showcase its self-developed vacuum thin-film equipment—covering magnetron sputtering, electron-beam evaporation, HFCVD diamond deposition—and comprehensive process solutions at the Shenzhen Bao’an Convention & Exhibition Center. Focusing on advanced packaging, precision optics, and optoelectronic manufacturing, we warmly invite industry peers to visit, engage in discussions, and explore new opportunities together!

Pengcheng Semiconductor Exhibition Highlights | The 8th Precision Ceramics Industry Chain Exhibition

From August 26 to 28, 2026, the three-day 8th Precision Ceramics Industry Chain Exhibition successfully concluded at Hall 7 of the Shenzhen International Convention and Exhibition Center (Bao’an New Venue). Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (hereinafter referred to as “Pengcheng Semiconductor”) showcased diamond‑based thermal‑dissipation wafers along with its core coating equipment—PVD coating systems and CVD coating systems—at Booth H20.