RF160 plasma cleaning machine
- Product Description
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Configuration and Metrics 1
Overall configuration Two sets of plasma generating devices, capacitive coupling and inductive coupling, are arranged to match the two cleaning chambers. 2
Capacitively coupled plasma configuration The cavity size of capacitively coupled plasma is Ø165X55mm, the distance between substrate and electrode is adjustable from 15 to 50mm, the limit vacuum degree is 0.1Pa, and the working vacuum degree is 60 to 500 Pa. 2 working gas path, with corresponding flow controller and instrument. Power output power 100W(30/60/100W) three adjustable. 3
Inductively Coupled Plasma Configuration The size of the quartz tube in the inductively coupled plasma is Ø160X190mm (wall thickness is 7mm), the ultimate vacuum degree is 0.1Pa, the ultimate vacuum degree is 0.1Pa, and the working vacuum degree is 60~500 Pa. 2 working gas path, with corresponding flow controller and instrument. Power output power of 7.2W, 10.2W, 29.6W three adjustable. 4
Vacuum pump parameters External vacuum pump, vacuum pump specifications 2L, AC220V
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Contact: Miss Dai
Address: 1704, Building 1, Chongwen Park, Nanshan Zhiyuan, 3370 Liuxian Avenue, Nanshan District, Shenzhen City, Guangdong Province
Shenyang Office Address: Shenyang University Science Park, No.15 Wanghua South Street, Dadong District, Shenyang City, Liaoning Province
Telephone:13632750017
E-mail:sales@hitsemi.com
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